pH Neutral Flux Cleaning Solution Specifically Designed for Semiconductor Electronics

HYDRON^?SE 220 is a water-based, single-phase cleaning solution specifically designed for immersion cleaning processes. It effectively removes flux residues from various semiconductor electronic devices such as lead frames after die attachment, discrete devices, power modules, and power LEDs. It also delivers excellent cleaning performance for flip chips, CMOS, and other components.

Advantages Compared to Other Cleaning Solutions:

• Due to its unique single-phase formulation, HYDRON^?SE 220 provides outstanding cleaning results in immersion processes. It can be easily rinsed with deionized water without leaving any residue.

• The product is pH neutral, offering excellent material compatibility, particularly without affecting the passivation layer on chip surfaces.

• HYDRON^?SE 220 delivers a clean, activated copper surface, maintaining it in an ideal state for a short period, ready for subsequent processes such as bonding, molding, and adhesion.

• HYDRON^?SE 220 has no flash point, making it suitable for use in immersion cleaning equipment without requiring explosion-proof protection.

• Halogen-free and low odor